Voyager – Raith

Electron beam lithography system for high-resolution patterning

• Universal sample holder for small sample pieces up to 100mm 10mm max height
• Electron beam energy 10 – 50kV
• Beam current range 50 pA – 40 nA
• Beam size < 2.5 nm diameter at 50 kV
• Minimum feature size 20 nm in high resolution positive resist
• Stage range x=150 by y=150mm z=20 mm
• Mark recognition gives overlay accuracy of <35 nm
• GDSII format viewer and editor
• Import AutoCAD DXF,bitmap, ASCII or CIF format converted to GDSII
• Traxx and Periodixx software option
• FBMS and MBMS software option