Spin coater
SPS Europe POLOS 200i
- Substrate size: 100 mm wafers
- Substrate thickness max 12 mm
- spin speed 5000 rpm
- Yields uniform coating thickness up to 100 micron
- Any coating may be applied in this tool
- Mobile system, must be set-up in a wet bench before use
AMOLF NanoLab Amsterdam
AMOLF NanoLab Amsterdam is a facility for materials fabrication and characterization down to the nanometer scale. It aims to provide state-of-the art opportunities in nano research, servicing the scientific and engineering community within the greater Amsterdam area.
