GenISys Beamer

Software that allows the user to correct their e-beam exposure pattern process effects, electron scattering effects, and tool artifacts which would otherwise result in non-ideal pattern transfer.

• Optimized field and shot placement
• Writing order control and advanced writing strategies
• Library of comprehensive layout processing functions
• Integrated layout editor
• Built-in Viewer for immediate inspection, verification, and measurement of patterns
• Proximity and process effect correction tools
• Electron-beam simulation of absorbed energy and resist contours