Substrate Conformal Imprint Lithography

Suss MABA6 UV Mask aligner with SCIL (SCIL)


A tool for fabricating nanostructures in which a master pattern is replicated via a stamping process, by molding a liquid material in the inverse shape of the stamp, after which it is solidified. This technique combines the advantages of a soft stamp with a rigid glass carrier for low pattern deformation and best resolution for large area patterning.

  • resolution down to sub 50nm on a 6” area
  • high aspect ratio structures
  • This tool is combined with the UV mask aligner

AMOLF NanoLab Amsterdam

AMOLF NanoLab Amsterdam is a facility for materials fabrication and characterization down to the nanometer scale. It aims to provide state-of-the art opportunities in nano research, servicing the scientific and engineering community within the greater Amsterdam area.

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