Lithography
Heidelberg uMLA (Direct Laser Writer)
A Tabletop maskless lithography tool
- 365 nm laser
- maximum substrate size: 6” x 6”
- minimum substrate size: 5 x 5 mm²
- maximum write area: 100 x 100 mm²
- substrate thickness: 0.1 to 12 mm
- encoder resolution: 20 nm, minimum feature size of 0.6 μm
- Raster mode and draw mode
AMOLF NanoLab Amsterdam
AMOLF NanoLab Amsterdam is a facility for materials fabrication and characterization down to the nanometer scale. It aims to provide state-of-the art opportunities in nano research, servicing the scientific and engineering community within the greater Amsterdam area.
