Spin coater
CEE Apogee 200 Spin coater
- Flat substrates up to 200 mm or fragments
- Substrate thickness max 12 mm
- spin speed 5000 rpm
- Yields uniform coating thickness up to 100 µm
- Only cleanroom standard resists are allowed!
Allowed resists only:
| Common name | Official name |
| CSAR 62 or just CSAR | AR-P 6200 |
| Elektra 92 or just Elektra | AR-PC 5092 |
| HSQ | XR 1541 |
| IP-G | IP-G |
| IP-L | IP-L |
| Ma-N 1400 | Ma-N 1400 |
| Ma-N 2400 | Ma-N 2400 |
| OrmoComp | OrmoComp |
| PMMA | 495 PMMA |
| PMMA | 950 PMMA |
| PMMA (imprint) | mr-I PMMA 35k |
| S1800 | Shipley S1800 |
| SU-8 | SU-8 3000 |
Explicit permission from staff member necessary for any other materials
AMOLF NanoLab Amsterdam
AMOLF NanoLab Amsterdam is a facility for materials fabrication and characterization down to the nanometer scale. It aims to provide state-of-the art opportunities in nano research, servicing the scientific and engineering community within the greater Amsterdam area.
