Atomic layer deposition
Veeco Fiji 2G (ALD)
A tool for highly controlled conformal material deposition. If your desired precursor isn’t present, you can request it with the AMOLF NanoLab staff.
- Thermal and plasma ALD
- Maximum substrate size 200 mm
- Available precursors.
- (Trimethyl)methylcyclopentadienylplatium (MPcPtMe3)
- Bis(diethylamino)silane (BDEASi)
- Cyclopentadienylindium (CpIn)
- Diethylzinc (DEZn)
- Tetrakis(dimethylamino)hafnium (TDMAHf)
- Tetrakis(dimethylamino)tin (TDMASn)
- Tetrakis(dimethylamino)titanium (TDMATi)
- Trimethylaluminum (TMA)
Additional equipment for use inside the wet benches:
- Nitrogen gun
- Demineralized water gun
- Branson 2800 Ultrasonic cleaning tank 40 kHz max 70 °C
- Sonosys Megasonic MSA-1800-4 1.8 MHz max 90 °C
- Heating plates
AMOLF NanoLab Amsterdam
AMOLF NanoLab Amsterdam is a facility for materials fabrication and characterization down to the nanometer scale. It aims to provide state-of-the art opportunities in nano research, servicing the scientific and engineering community within the greater Amsterdam area.
