Etching
SPTS uEtch HF vapor etcher (HF vapour etcher)
Integrated etch system that offers controlled vapor phase sacrificial oxide etching.
- KLA SPTS µEtch
- Single-wafer process tool
- Loader handles 100 –200 mm wafers
- Heated chamber and delivery line
- HF vapor flow control : 0 – 750 sccm
- Alcohol vapor flow control : 0 – 250 sccm ethanol vapor
- Process nitrogen flow control : 0 – 2 slm
- Operating pressure range 50 – 150 torr
AMOLF NanoLab Amsterdam
AMOLF NanoLab Amsterdam is a facility for materials fabrication and characterization down to the nanometer scale. It aims to provide state-of-the art opportunities in nano research, servicing the scientific and engineering community within the greater Amsterdam area.
